Prof. Baoqin Chen Profile

Prof. Baoqin Chen

at Institute of Microelectronics

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Author

Publications (9)

Proceedings Article | 21 August 2014 Paper

Technology of alignment mark in electron beam lithography

Min Zhao, Tang Xu, Baoqin Chen, Jiebin Niu

Proceedings Volume 9285, 92850C (2014) https://doi.org/10.1117/12.2068112

KEYWORDS: Optical alignment, Signal detection, Electron beam lithography, Electron beams, Metals, Silicon, Signal to noise ratio, Microscopes, Signal processing, Lithography

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SPIE Journal Paper | 1 May 2008

Design, fabrication, and test of soft x-ray sinusoidal transmission grating

Min Zhao, Xiaoli Zhu, Baoqin Chen, Changqing Xie, Min Liu, Jiebing Niu, Longyu Kuang, Leifeng Cao

OE, Vol. 47, Issue 05, 058001, (May 2008) https://doi.org/10.1117/12.10.1117/1.2919717

KEYWORDS: X-ray lithography, X-rays, Diffraction gratings, Diffraction, Lithography, Photomasks, Gold, X-ray diffraction, Spectroscopy, Spectrographs

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Proceedings Article | 21 November 2007 Paper

Fabrication of quantum dot array diffraction grating for soft x-ray spectroscopy

Min Zhao, XiaoLi Zhu, Baoqin Chen, ChangQing Xie, Ming Liu, Leifeng Cao

Proceedings Volume 6724, 67241O (2007) https://doi.org/10.1117/12.782916

KEYWORDS: X-rays, Spectroscopy, Diffraction, Electron beam lithography, X-ray diffraction, X-ray lithography, Gold, Photomasks, Electron beams, Silicon

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Proceedings Article | 21 November 2007 Paper

Analysis of property of HSQ in electron beam lithography

Min Zhao, XiaoLi Zhu, Baoqin Chen, Jiebin Niu, Ming Liu, Changqing Xie

Proceedings Volume 6827, 682728 (2007) https://doi.org/10.1117/12.757739

KEYWORDS: Electron beam lithography, Silicon, Electron beams, Chemical species, Hydrogen, Backscatter, Nanoimprint lithography, Lithography, Nanolithography, Nanostructures

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Proceedings Article | 14 November 2007 Paper

Fabrication of x-ray diffractive optical elements for ICF target diagnosis

Xiaoli Zhu, Deqiang Wang, Changqing Xie, Leifeng Cao, Jiamin Yang, Tianchun Ye, Jiebin Niu, Baoqin Chen, Ming Liu

Proceedings Volume 6722, 672208 (2007) https://doi.org/10.1117/12.782678

KEYWORDS: X-rays, Electron beam lithography, Diffractive optical elements, Electroplating, Gold, Photomasks, X-ray diffraction, X-ray lithography, Silicon, X-ray optics

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Proceedings Article | 27 January 2005 Paper

The application of optical resolution enhancement technology and e-beam direct writing technology in microfabrication

Yulin Qiu, Baoqin Chen, Ming Liu, Qiuxia Xu, Lijun Xue, Liming Ren, Yong Hu, Shibing Long, Jing Lu, Xiaohui Kang, Ling Li, Jinru Li, Yueke Tang

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.576170

KEYWORDS: Lithography, Electron beam lithography, Resolution enhancement technologies, Optical proximity correction, Microelectronics, Optical lithography, Computer aided design, Photomasks, 193nm lithography, Mask making

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Proceedings Article | 27 January 2005 Paper

Method of printing 100-nm random interconnect pattern with alt-PSM

Jing Lu, Baoqin Chen, Ming Liu, Xiaohui Kang

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.572232

KEYWORDS: Photomasks, Lithography, Nanoimprint lithography, Optical lithography, Manufacturing, Phase shifts, Optical proximity correction, Resolution enhancement technologies, Printing, Light sources

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Proceedings Article | 27 January 2005 Paper

Process study of ZEP520 positive electron-beam resist and its application in single-electron transistor

Shibing Long, Zhigang Li, Xinwei Zhao, Baoqin Chen, Ming Liu

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.572561

KEYWORDS: Silicon, Gallium arsenide, Scanning electron microscopy, Photomicroscopy, Transistors, Polymethylmethacrylate, Electrons, Electron beam lithography, Semiconducting wafers, Coating

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Proceedings Article | 27 January 2005 Paper

The advanced nanofabrication technology

Ming Liu, Qiuxia Xu, Baoqin Chen, Changqing Xie, Tianchun Ye, Xinchun Liu

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.570206

KEYWORDS: Optical lithography, Electron beam lithography, Lithography, X-ray lithography, Photomasks, Gallium arsenide, Optical proximity correction, Etching, Nanofabrication, Resolution enhancement technologies

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Showing 5 of 9 publications

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