The semiconductor industry is an unbelievable fast-growing field with an exponential growth in the space optimization. But also, other large industrial field are getting smaller in the structure size, for example the field of optics. On the other hand, the customer demands get more and more complex and individual. This leads to an enormous growth potential for micro- and nanofabrication with direct laser writing. Under this circumstance the idea for a micro- and nanostructuring possibility with high precision on large areas was born. A setup was developed to combine a nanopositioning and nanomeasuring machine (NMM-1) with an extremely high precision and a two-photon based illumination system to realize a high-precision direct laser writing system. Besides its high positioning resolution of 0.1 nm and its metrological traceability based on an interferometrical measurement setup, the NMM-1 offers a positioning range of 25 mm x 25 mm x 5 mm. The aim is to design a direct laser writing setup, which enables a trans-scale fabrication without any stitching or combination of different positioning systems necessary. In order to benefit from this high positional accuracy, studies have been made to investigated the two photon absoption process and reduce line widths. The presented research shows investigations, which were made with the developed laser writing setup, to invested illumination dose and the voxel position of the writing laser, in order to improve microstructuring and to reduce structure widths.
Two-photon-absorption (2PA) techniques enables the possibility to create extremely fine structures in photosensitive materials. For direct laser writing as micro- or nanofabrication a laser system can be combined with highly precise positioning systems. These are mostly limited by a few hundreds micrometer positioning range with applications based on piezoelectric stages or even just relatively few tens micrometer positioning range with applications based on galvanometer scanners. Although these techniques are precise, but stitching methods are required for larger fabrication areas. Therefore, a setup consisting of a femtosecond laser for 2PA and a nanopositioning and nanomeasuring machine (NMM-1) was developed for high precision laser writing on lager surfaces. Further developments of the system should enable a significant improvement in high-precision and stitching free direct laser writing. In order to combine the the femtosecond laser and the NMM-1 into a functional unit, to write complex structures with highest accuracy and homogeneity, further improvements like a beam expansion for a better use of the numerical aperture of the objective and a new femtosecond laser with a integrated power measurement are realized. This showed improvements in line width for nano strucuring. Advantages and disadvantages as well as further developments of the NMM-1 system will be discussed related to current developments in the laser beam and nanopositioning system optimization.
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