Ms. Ai Kumada Profile

Ai Kumada

at Toshiba Corp

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Publications (2)

Proceedings Article | 29 September 2019 Presentation + Paper

Capability of DUV inspection for the LWR improved EUV mask of sub-15 nm hp on wafer

Masato Naka, Keisuke Chiba, Ai Kumada, Keiko Morishita, Kosuke Takai, Ryoji Yoshikawa, Yukiyasu Arisawa, Takashi Kamo, Eishi Shiobara, Shingo Kanamitsu

Proceedings Volume 11148, 111480X (2019) https://doi.org/10.1117/12.2536474

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Line width roughness, Signal to noise ratio, Deep ultraviolet, Scanning electron microscopy, Critical dimension metrology, Extreme ultraviolet lithography

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Proceedings Article | 13 July 2017 Paper

Application of EB repair for nanoimprint lithography template

Ai Kumada, Keiko Morishita, Keisuke Yagawa, Ryoji Yoshikawa, Takashi Hirano, Masamitsu Itoh

Proceedings Volume 10454, 104540Q (2017) https://doi.org/10.1117/12.2280685

KEYWORDS: Nanoimprint lithography, Lithography, Critical dimension metrology, Etching, Scanning electron microscopy, Electron beam lithography, Semiconducting wafers, Electron beams, Optical lithography, Semiconductors

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