25 January 2020 Mode, dispersion, and loss analysis of a graded-index germanium-doped silicon buried strip waveguide
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Abstract

The mode, loss, and dispersion characteristics of a buried strip waveguide have been calculated for coarse wavelength division multiplexing wavelengths. Process simulation has been used to form the graded-index core by germanium implantation in silicon. Quasivectorial finite-difference method has been used to calculate the number of propagating modes, effective indices, material absorption, mode confinement, and the dispersion parameters. The scattering loss has been determined from the Payne–Lacey model. The zero dispersion for higher-order modes occurs in the O-band, which is suitable for short-reach multimodal applications. The usable waveguide length and number of modes have been characterized and are limited by the mode with highest propagation loss/dispersion and lowest mode confinement, respectively.

© 2020 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286/2020/$28.00 © 2020 SPIE
Darpan Mishra and Ramesh Kumar Sonkar "Mode, dispersion, and loss analysis of a graded-index germanium-doped silicon buried strip waveguide," Optical Engineering 59(1), 016118 (25 January 2020). https://doi.org/10.1117/1.OE.59.1.016118
Received: 25 October 2019; Accepted: 9 January 2020; Published: 25 January 2020
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Waveguides

Dispersion

Wave propagation

Silicon

Refractive index

Germanium

Absorption

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