Process control for a SiO2 buffer layer of LiNbO3 modulators to obtain reduced dc drift performance

Hirotoshi Nagata; Toshinari Kitanobo; Kaori Shima; Masaru Shiroishi

doi:10.1117/1.601587

1 December 1997 Process control for a SiO2 buffer layer of LiNbO3 modulators to obtain reduced dc drift performance

Hirotoshi Nagata, Toshinari Kitanobo, Kaori Shima, Masaru Shiroishi

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Optical Engineering, Vol. 36, Issue 12, (December 1997). https://doi.org/10.1117/1.601587

This PDF contains the communications section which includes "Process control for a SiO2 buffer layer of LiNbO3 modulators to obtain reduced dc drift performance"

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Hirotoshi Nagata, Toshinari Kitanobo, Kaori Shima, and Masaru Shiroishi "Process control for a SiO2 buffer layer of LiNbO3 modulators to obtain reduced dc drift performance," Optical Engineering 36(12), (1 December 1997). https://doi.org/10.1117/1.601587

Published: 1 December 1997

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