Stereolithographic patterning of diazonaphthoquinone/novolac photoresist

Theodore M. Bloomstein; Stephen T. Palmacci; Roderick R. Kunz; Mordechai Rothschild

doi:10.1117/1.1668270

1 April 2004 Stereolithographic patterning of diazonaphthoquinone/novolac photoresist

Theodore M. Bloomstein, Stephen T. Palmacci, Roderick R. Kunz, Mordechai Rothschild

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 3, Issue 2, (April 2004). https://doi.org/10.1117/1.1668270

Abstract

A fabrication process has been developed which prevents solvent intermixing between layers of diazonaphthoquinone/novolac (DNQ/novolac) based resist. The process enables three-dimensional structures to be batch fabricated stereolithographically using integrated circuit-compatible resist, coating, and exposure techniques, followed by a single development step. To prevent solvent intermixing, a combination of solvent tailoring and surface treatment is employed. The photoresist is first constituted into a weaker, less polar solvent. Before coating a new layer, the surface is exposed to ozone, thus increasing the hydrophilicity of the surface and providing a less soluble barrier layer. This enables the formation of a stack of successively photoimaged layers of the same material, which are then developed in a single step. A new interlayer dose modulation technique to optimize the development process in positive tone resists such as DNQ/novolac is also described.

©(2004) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Theodore M. Bloomstein, Stephen T. Palmacci, Roderick R. Kunz, and Mordechai Rothschild "Stereolithographic patterning of diazonaphthoquinone/novolac photoresist," Journal of Micro/Nanolithography, MEMS, and MOEMS 3(2), (1 April 2004). https://doi.org/10.1117/1.1668270

Published: 1 April 2004

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