Aberration retrieval using the extended Nijboer-Zernike approach

Peter Dirksen; Joseph J. M. Braat; Augustus Janssen; Casper A. H. Juffermans

doi:10.1117/1.1531191

1 January 2003 Aberration retrieval using the extended Nijboer-Zernike approach

Peter Dirksen, Joseph J. M. Braat, Augustus Janssen, Casper A. H. Juffermans

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 2, Issue 1, (January 2003). https://doi.org/10.1117/1.1531191

Abstract

We give the proof of principle of a new experimental method to determine the aberrations of an optical system in the field. The measurement is based on the observation of the intensity point-spread function of the lens. To analyze and interpret the measurement, use is made of an analytical method, the so-called extended Nijboer-Zernike approach. The new method is applicable to lithographic projection lenses, but also to EUV mirror systems or microscopes such as the objective lens of an optical mask inspection tool. Phase retrieval is demonstrated both analytically and experimentally. The extension of the method to the case of a medium-to-large hole sized test object is presented. Theory and experimental results are given. In addition we present the extension to the case of aberrations comprising both phase and amplitude errors.

©(2003) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Peter Dirksen, Joseph J. M. Braat, Augustus Janssen, and Casper A. H. Juffermans "Aberration retrieval using the extended Nijboer-Zernike approach," Journal of Micro/Nanolithography, MEMS, and MOEMS 2(1), (1 January 2003). https://doi.org/10.1117/1.1531191

Published: 1 January 2003

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