Potential of the FLASH free electron laser technology for the construction of a kW-scale light source for next-generation lithography

Evgeny A. Schneidmiller; Vladimir F. Vogel; Hans Weise; Mikhail V. Yurkov

doi:10.1117/1.JMM.11.2.021122

29 May 2012 Potential of the FLASH free electron laser technology for the construction of a kW-scale light source for next-generation lithography

Evgeny A. Schneidmiller, Vladimir F. Vogel, Hans Weise, Mikhail V. Yurkov

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 2, 021122 (May 2012). https://doi.org/10.1117/1.JMM.11.2.021122

Abstract

The driving engine of the free electron laser in Hamburg (FLASH) is an L-band superconducting accelerator. It is designed to operate in burst mode with an 800-ms pulse duration at a repetition rate of 10 Hz. The maximum accelerated beam current during the macropulse is 9 mA. Our analysis shows that the FLASH technology has great potential since it is possible to construct a FLASH-like free electron laser operating at the wavelength of 13.5 and 6.8 nm with an average power of up to 2.6 kW. Such a source meets the physical requirements for the light source for next-generation lithography.

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Evgeny A. Schneidmiller, Vladimir F. Vogel, Hans Weise, and Mikhail V. Yurkov "Potential of the FLASH free electron laser technology for the construction of a kW-scale light source for next-generation lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(2), 021122 (29 May 2012). https://doi.org/10.1117/1.JMM.11.2.021122

Published: 29 May 2012

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