Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 4: Placement and Critical Dimension, Edge to Edge Overlay

Alexander Starikov

doi:10.1117/1.JMM.18.2.021201

17 June 2019 Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 4: Placement and Critical Dimension, Edge to Edge Overlay

Alexander Starikov

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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 2, 021201 (June 2019). https://doi.org/10.1117/1.JMM.18.2.021201

Abstract

This guest editorial introduces the Special Section on Control of Integrated Circuit Patterning Variance, Part 4: Placement and Critical Dimension, Edge to Edge Overlay.

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Alexander Starikov "Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 4: Placement and Critical Dimension, Edge to Edge Overlay," Journal of Micro/Nanolithography, MEMS, and MOEMS 18(2), 021201 (17 June 2019). https://doi.org/10.1117/1.JMM.18.2.021201

Published: 17 June 2019

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