Lithographic Electrochemistry
Abstract
Some lithographic operations and processes are based on electrochemical phenomena. Two notable examples include (1) corrosion of metallic chrome (Cr) and molybdenum silicon (MoSi) absorber structures in optical masks and (2) electrochemical imprint lithography. Both phenomena are based on electrochemical anodic oxidation. We explore in this chapter the electrochemical basis of these two phenomena.
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KEYWORDS
Chromium

Reticles

Corrosion

Lithography

Photomasks

Oxides

Metals

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