Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
Abstract
Some lithographic operations and processes are based on electrochemical phenomena. Two notable examples include (1) corrosion of metallic chrome (Cr) and molybdenum silicon (MoSi) absorber structures in optical masks and (2) electrochemical imprint lithography. Both phenomena are based on electrochemical anodic oxidation. We explore in this chapter the electrochemical basis of these two phenomena.
Online access to SPIE eBooks is limited to subscribing institutions.