Modeling tools for use of displacement Talbot lithography for high volume AR waveguide manufacturing

Kelsey Wooley; Andrew M. C. Dawes; Zhixin Wang; Maryvonne Chalony; Harun Solak; Lawrence S. Melvin

doi:10.1117/12.3003908

13 March 2024 Modeling tools for use of displacement Talbot lithography for high volume AR waveguide manufacturing

Kelsey Wooley, Andrew M. C. Dawes, Zhixin Wang, Maryvonne Chalony, Harun Solak, Lawrence S. Melvin

Proceedings Volume PC12913, Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) V; PC129130R (2024) https://doi.org/10.1117/12.3003908
Event: SPIE AR | VR | MR, 2024, San Francisco, California, United States

Conference Poster

Abstract

Displacement Talbot Lithography (DTL) has emerged as a viable technology that relies on the proven photolithography approach of the semiconductor industry while offering a specific, low-cost solution for large area printing of periodic structures of the kind required on waveguides. Electronic Design Automation (EDA) tools are necessary for standard projection lithography approaches, and now can be used to understand DTL interactions with waveguide designs. Here, we present the first results from the development of a complete design and optimization approach that facilitates fabrication of waveguide devices with optimum processing conditions and targeted device performance.

Citation Download Citation

Kelsey Wooley, Andrew M. C. Dawes, Zhixin Wang, Maryvonne Chalony, Harun Solak, and Lawrence S. Melvin "Modeling tools for use of displacement Talbot lithography for high volume AR waveguide manufacturing", Proc. SPIE PC12913, Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) V, PC129130R (13 March 2024); https://doi.org/10.1117/12.3003908

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