Displacement talbot lithography: a new and versatile technology for printing periodic nanostructures (Conference Presentation)

Harun H. Solak

doi:10.1117/12.2635960

4 October 2022 Displacement talbot lithography: a new and versatile technology for printing periodic nanostructures (Conference Presentation)

Harun H. Solak

Author Affiliations +

Proceedings Volume PC12201, UV and Higher Energy Photonics: From Materials to Applications 2022; PC1220106 (2022) https://doi.org/10.1117/12.2635960
Event: SPIE Nanoscience + Engineering, 2022, San Diego, California, United States

Abstract

High-resolution periodic patterns such as gratings or two-dimensional arrays are required in many applications, especially in photonics devices such as near eye displays (AR/VR), DFB lasers or plasmonic or diffraction based biosensors. Displacement Talbot Lithography (DTL) is a new photolithography technique that enables patterning of large areas with high-resolution periodic structures. DTL offers resolution well below 100nm, which is sufficient even for the most demanding applications that require sub-wavelength resolution such as wire-grid polarizers or anti-reflection surfaces. The new imaging principle of DTL opens new possibilities in the field of photo lithography and its applications.

Conference Presentation

Citation Download Citation

Harun H. Solak "Displacement talbot lithography: a new and versatile technology for printing periodic nanostructures (Conference Presentation)", Proc. SPIE PC12201, UV and Higher Energy Photonics: From Materials to Applications 2022, PC1220106 (4 October 2022); https://doi.org/10.1117/12.2635960

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