PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The alert did not successfully save. Please try again later.
Nathalie Frolet, Emma Porcheron, Karine Jullian, Michael May, Yuji Tanaka, Masahiko Harumoto, Raluca Tiron, "Intra track backside cleaning optimization to reduce the focus spot in Immersion lithography cluster," Proc. SPIE PC12055, Advances in Patterning Materials and Processes XXXIX, PC120550M (13 June 2022); https://doi.org/10.1117/12.2614242