Megasonic cleaning strategy for sub-10nm photomasks

Jyh-Wei Hsu; Martin Samayoa; Peter Dress; Uwe Dietze; Ai-Jay Ma; Chia-Shih Lin; Rick Lai; Peter Chang; Laurent Tuo

doi:10.1117/12.2241143

4 October 2016 Megasonic cleaning strategy for sub-10nm photomasks

Jyh-Wei Hsu, Martin Samayoa, Peter Dress, Uwe Dietze, Ai-Jay Ma, Chia-Shih Lin, Rick Lai, Peter Chang, Laurent Tuo

Proceedings Volume 9985, Photomask Technology 2016; 998515 (2016) https://doi.org/10.1117/12.2241143
Event: SPIE Photomask Technology, 2016, San Jose, California, United States

Abstract

One of the main challenges in photomask cleaning is balancing particle removal efficiency (PRE) with pattern damage control. To overcome this challenge, a high frequency megasonic cleaning strategy is implemented. Apart from megasonic frequency and power, photomask surface conditioning also influences cleaning performance. With improved wettability, cleanliness is enhanced while pattern damage risk is simultaneously reduced. Therefore, a particle removal process based on higher megasonic frequencies, combined with proper surface pre-treatment, provides improved cleanliness without the unintended side effects of pattern damage, thus supporting the extension of megasonic cleaning technology into 10nm half pitch (hp) device node and beyond.

Citation Download Citation

Jyh-Wei Hsu, Martin Samayoa, Peter Dress, Uwe Dietze, Ai-Jay Ma, Chia-Shih Lin, Rick Lai, Peter Chang, and Laurent Tuo "Megasonic cleaning strategy for sub-10nm photomasks", Proc. SPIE 9985, Photomask Technology 2016, 998515 (4 October 2016); https://doi.org/10.1117/12.2241143

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