Modeling of grating formation in photopolymer that does not need scheduling
(Conference Presentation)

Tsutomu Shimura; Yuki Takeda; Masao Endo; Shinsuke Umegaki; Ryushi Fujimura

doi:10.1117/12.2240263

2 November 2016 Modeling of grating formation in photopolymer that does not need scheduling (Conference Presentation)

Tsutomu Shimura, Yuki Takeda, Masao Endo, Shinsuke Umegaki, Ryushi Fujimura

Proceedings Volume 9959, Optical Data Storage 2016; 99590A (2016) https://doi.org/10.1117/12.2240263
Event: SPIE Optical Engineering + Applications, 2016, San Diego, California, United States

Abstract

Recently new photopolymers that does not require scheduled exposure in the multiple page writing for the holographic memory was introduced. Its sensitivity does not decrease throughout the multiple page writing process. We will explain why this photopolymer has such a property with our reaction model. The key is the existence of the molecules which make seeds of the polymers. At the first exposure process to record the page data, seeds are produced corresponding to the light intensity distribution. Then after writing the information of all multiplexed pages, the seeds are growing to be polymers under the spatially uniform light illumination.

Conference Presentation

Citation Download Citation

Tsutomu Shimura, Yuki Takeda, Masao Endo, Shinsuke Umegaki, and Ryushi Fujimura "Modeling of grating formation in photopolymer that does not need scheduling (Conference Presentation)", Proc. SPIE 9959, Optical Data Storage 2016, 99590A (2 November 2016); https://doi.org/10.1117/12.2240263

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