Hybrid pattern matching based SRAF placement

Ahmed Omran; Andrey Lutich; Uwe Paul Schroeder

doi:10.1117/12.2225830

16 March 2016 Hybrid pattern matching based SRAF placement

Ahmed Omran, Andrey Lutich, Uwe Paul Schroeder

Proceedings Volume 9781, Design-Process-Technology Co-optimization for Manufacturability X; 978117 (2016) https://doi.org/10.1117/12.2225830
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

A hybrid multi-step method for Sub-Resolution Assist Feature (SRAF) placement is presented. The process window, characterized by process variation bands (PV-bands), is subjected to optimization. By applying a state-of-the-art advanced pattern matching based approach, the SRAF placement is optimized to maximize the process window. Due to the complexity of building a complete Rule-Based SRAF (RBSRAF) solution and the performance limitation of the Model-Based SRAF solution (MBSRAF), the hybrid pattern based SRAF reduces the complexity and improves performance. In this paper, the hybrid pattern-based SRAF algorithm and its implementation, as well as testing results, are discussed with respect to process window and performance.

Citation Download Citation

Ahmed Omran, Andrey Lutich, and Uwe Paul Schroeder "Hybrid pattern matching based SRAF placement", Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 978117 (16 March 2016); https://doi.org/10.1117/12.2225830

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