Optimal design of wide-view-angle waveplate used for polarimetric diagnosis of lithography system

Honggang Gu; Hao Jiang; Chuanwei Zhang; Xiuguo Chen; Shiyuan Liu

doi:10.1117/12.2219139

15 March 2016 Optimal design of wide-view-angle waveplate used for polarimetric diagnosis of lithography system

Honggang Gu, Hao Jiang, Chuanwei Zhang, Xiuguo Chen, Shiyuan Liu

Proceedings Volume 9780, Optical Microlithography XXIX; 97801M (2016) https://doi.org/10.1117/12.2219139
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

The diagnosis and control of the polarization aberrations is one of the main concerns in a hyper numerical aperture (NA) lithography system. Waveplates are basic and indispensable optical components in the polarimetric diagnosis tools for the immersion lithography system. The retardance of a birefringent waveplate is highly sensitive to the incident angle of the light, which makes the conventional waveplate not suitable to be applied in the polarimetric diagnosis for the immersion lithography system with a hyper NA. In this paper, we propose a method for the optimal design of a wideview- angle waveplate by combining two positive waveplates made from magnesium fluoride (MgF₂) and two negative waveplates made from sapphire using the simulated annealing algorithm. Theoretical derivations and numerical simulations are performed and the results demonstrate that the maximum variation in the retardance of the optimally designed wide-view-angle waveplate is less than ± 0.35° for a wide-view-angle range of ± 20°.

Citation Download Citation

Honggang Gu, Hao Jiang, Chuanwei Zhang, Xiuguo Chen, and Shiyuan Liu "Optimal design of wide-view-angle waveplate used for polarimetric diagnosis of lithography system", Proc. SPIE 9780, Optical Microlithography XXIX, 97801M (15 March 2016); https://doi.org/10.1117/12.2219139

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KEYWORDS

Wave plates

Magnesium fluoride

Sapphire

Polarimetry

Algorithms

Immersion lithography

Polarization

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