Expected innovations of optical lithography in the next 10 years

Soichi Owa; Noriyuki Hirayanagi

doi:10.1117/12.2219918

15 March 2016 Expected innovations of optical lithography in the next 10 years

Soichi Owa, Noriyuki Hirayanagi

Proceedings Volume 9780, Optical Microlithography XXIX; 978004 (2016) https://doi.org/10.1117/12.2219918
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

In the past 10 years, immersion lithography has been the most effective high volume manufacturing method for the critical layers of semiconductor devices. Thinking of the next 10 years, we can expect continuous improvement on existing 300 mm wafer scanners with better accuracy and throughput to enhance the total output value per input cost. This value productivity, however, can be upgraded also by larger innovations which might happen in optical lithography. In this paper, we will discuss the possibilities and the impossibilities of potential innovation ideas of optical lithography, which are 450 mm wafer, optical maskless, multicolor lithography, and metamaterial.

Citation Download Citation

Soichi Owa and Noriyuki Hirayanagi "Expected innovations of optical lithography in the next 10 years", Proc. SPIE 9780, Optical Microlithography XXIX, 978004 (15 March 2016); https://doi.org/10.1117/12.2219918

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