Reliable characterization of materials and nanostructured systems <<50nm using coherent EUV beams

Jorge Hernandez-Charpak; Travis Frazer; Joshua Knobloch; Kathleen Hoogeboom-Pot; Damiano Nardi; Weilun Chao; Lei Jiang; Marie Tripp; Sean King; Henry Kapteyn; Margaret Murnane

doi:10.1117/12.2219434

21 April 2016 Reliable characterization of materials and nanostructured systems <<50nm using coherent EUV beams

Jorge Hernandez-Charpak, Travis Frazer, Joshua Knobloch, Kathleen Hoogeboom-Pot, Damiano Nardi, Weilun Chao, Lei Jiang, Marie Tripp, Sean King, Henry Kapteyn, Margaret Murnane

Author Affiliations +

Proceedings Volume 9778, Metrology, Inspection, and Process Control for Microlithography XXX; 97780I (2016) https://doi.org/10.1117/12.2219434
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Coherent extreme ultraviolet beams from tabletop high harmonic generation offer revolutionary capabilities for observing nanoscale systems on their intrinsic length and time scales. By launching and monitoring acoustic waves in such systems, we fully characterize sub-10nm films and find that the Poisson’s ratio of low-k dielectric materials does not stay constant as often assumed, but increases when bond coordination is bellow a critical value. Within the same measurement, by following the heat dissipation dynamics from nano-gratings of width 20-1000nm and different periodicities, we confirm the effects of the newly identified collectively-diffusive regime, where close-spaced nanowires cool faster than widely-spaced ones.

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Jorge Hernandez-Charpak, Travis Frazer, Joshua Knobloch, Kathleen Hoogeboom-Pot, Damiano Nardi, Weilun Chao, Lei Jiang, Marie Tripp, Sean King, Henry Kapteyn, and Margaret Murnane "Reliable characterization of materials and nanostructured systems <<50nm using coherent EUV beams", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97780I (21 April 2016); https://doi.org/10.1117/12.2219434

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