Paper
7 April 2016 Measurement of asymmetric side wall angles by coherent scanning Fourier scatterometry
M. L. Gödecke, S. Peterhänsel, K. Frenner, W. Osten
Author Affiliations +
Abstract
We propose a measurement technique which enables the precise determination of side wall angles (SWAs) with absolute values below 1°. Our simulations show that a differentiation between asymmetric SWAs is also possible. The grating structure under investigation has a grating period on the order of a few micrometers. Each grating line consists of a fine sub-grating with 40 nm period and 20 nm critical dimension. Our approach is based on coherent high-NA Fourier scatterometry, extended by a lateral scan over the sample. Additionally, a 180°-shearing element allows for coherent superposition of the higher diffraction orders.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. L. Gödecke, S. Peterhänsel, K. Frenner, and W. Osten "Measurement of asymmetric side wall angles by coherent scanning Fourier scatterometry", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97780G (7 April 2016); https://doi.org/10.1117/12.2218824
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Cited by 1 scholarly publication.
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KEYWORDS
Diffraction

Polarization

Scatterometry

Diffraction gratings

Sensors

Mirrors

Silicon

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