Paper
1 April 2016 Improved cost-effectiveness of the block co-polymer anneal process for DSA
Hari Pathangi, Maarten Stokhof, Werner Knaepen, Varun Vaid, Arindam Mallik, Boon Teik Chan, Nadia Vandenbroeck, Jan Willem Maes, Roel Gronheid
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Abstract
This manuscript first presents a cost model to compare the cost of ownership of DSA and SAQP for a typical front end of line (FEoL) line patterning exercise. Then, we proceed to a feasibility study of using a vertical furnace to batch anneal the block co-polymer for DSA applications. We show that the defect performance of such a batch anneal process is comparable to the process of record anneal methods. This helps in increasing the cost benefit for DSA compared to the conventional multiple patterning approaches.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hari Pathangi, Maarten Stokhof, Werner Knaepen, Varun Vaid, Arindam Mallik, Boon Teik Chan, Nadia Vandenbroeck, Jan Willem Maes, and Roel Gronheid "Improved cost-effectiveness of the block co-polymer anneal process for DSA", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97771Z (1 April 2016); https://doi.org/10.1117/12.2220043
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CITATIONS
Cited by 4 scholarly publications.
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KEYWORDS
Directed self assembly

Optical lithography

Semiconducting wafers

Front end of line

Etching

Lithography

Annealing

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