Paper
15 March 2016 MOEMS FPI sensors for NIR-MIR microspectrometer applications
A. Akujärvi, B. Guo, R. Mannila, A. Rissanen
Author Affiliations +
Proceedings Volume 9760, MOEMS and Miniaturized Systems XV; 97600M (2016) https://doi.org/10.1117/12.2214710
Event: SPIE OPTO, 2016, San Francisco, California, United States
Abstract
This paper presents near- and mid- infrared (NIR-MIR) wavelength range optical MEMS Fabry-Perot interferometers (FPIs) developed for automotive and multi-gas sensing applications. MEMS FPI platform for NIR-range consist of LPCVD (low-pressure chemical vapour) deposited polySi-SiN λ/4-thin film Bragg reflectors, with the air gap formed by sacrificial SiO2 etching in HF vapour. Characterization results for the NIR MFPI devices for λ = 1.5 – 2.0 μm show resolution of 15 nm at the optimization wavelength of 1750 nm. We also present a MIR-range MEMS FPI for λ = 2.5 – 3.5 μm, which utilizes silicon and air in within the Bragg reflector structure to provide a high contrast for improved resolution. Characterization results show a FWHM (Full Width Half Maximum) of 20 nm in comparison to the 50 nm resolution provided by earlier MEMS FPIs realized for hydrocarbon sensing with conventional CVD-thin film materials. The improved resolution and the extended operation region shows potential to enable simultaneous sensing of CO2 and multiple hydrocarbons.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Akujärvi, B. Guo, R. Mannila, and A. Rissanen "MOEMS FPI sensors for NIR-MIR microspectrometer applications", Proc. SPIE 9760, MOEMS and Miniaturized Systems XV, 97600M (15 March 2016); https://doi.org/10.1117/12.2214710
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Cited by 7 scholarly publications.
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KEYWORDS
Microelectromechanical systems

Mirrors

Near infrared

Optical lithography

Etching

Low pressure chemical vapor deposition

Microopto electromechanical systems

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