Design and simulation of large field plate lithography lens

Chao Deng; Tingwen Xing; Wumei Lin; Xianchang Zhu

doi:10.1117/12.2245717

25 October 2016 Design and simulation of large field plate lithography lens

Chao Deng, Tingwen Xing, Wumei Lin, Xianchang Zhu

Proceedings Volume 9685, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials; 96850V (2016) https://doi.org/10.1117/12.2245717
Event: Eighth International Symposium on Advanced Optical Manufacturing and Testing Technology (AOMATT2016), 2016, Suzhou, China

Abstract

Because industry demand for LED,LCD panel continues to increase, the high yield of micron-scale resolution lithography is increasingly prominent for manufacturers, which requires the field of lithography objective lens becomes larger. This paper designed a lithography lens with large field, whose effective image side field will reach to 132 × 132mm.Subsequently, the tolerance was analysed by simulation for the optical system. Finally, it is proved that the design meets the requirements of micron-scale resolution.

Citation Download Citation

Chao Deng, Tingwen Xing, Wumei Lin, and Xianchang Zhu "Design and simulation of large field plate lithography lens", Proc. SPIE 9685, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, 96850V (25 October 2016); https://doi.org/10.1117/12.2245717

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