|
We reported capability of defect verification based on lithography simulation with a SEM system that architecture and software is excellent correlation for simple line and space.[1] In this paper, we use a SEM system for the next generation combined with a lithography simulation tool for SMO-ILT, NTD and other complex pattern lithography. Furthermore we will use three dimension (3D) lithography simulation based on Multi Vision Metrology SEM system. Finally, we will confirm the performance of the 2D and 3D lithography simulation based on SEM system for a photomask verification. |
ACCESS THE FULL ARTICLE
No SPIE Account? Create one
Photomasks
Lithography
Scanning electron microscopy
Semiconducting wafers
Critical dimension metrology
3D metrology
Bridges
