A study of reticle CD behavior for inter-area pattern loading difference

Sungjin Kim; Kweonjae Lee; Jongsuk Yim; Hyunjoong Kim; Sukwhan Kim; Sukho Shin; Woosun Choi; Jinhee Jung; Kyungwha Chun; Inja Lee; Jooyoung Lee; Hyeongsun Hong; Gyoyoung Jin

doi:10.1117/12.2196988

23 October 2015 A study of reticle CD behavior for inter-area pattern loading difference

Sungjin Kim, Kweonjae Lee, Jongsuk Yim, Hyunjoong Kim, Sukwhan Kim, Sukho Shin, Woosun Choi, Jinhee Jung, Kyungwha Chun, Inja Lee, Jooyoung Lee, Hyeongsun Hong, Gyoyoung Jin

Author Affiliations +

Proceedings Volume 9635, Photomask Technology 2015; 96351U (2015) https://doi.org/10.1117/12.2196988
Event: SPIE Photomask Technology, 2015, Monterey, California, United States

Abstract

We can control the pattern on wafer without optimization of layout design if we understand reticle cd behavior

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Sungjin Kim, Kweonjae Lee, Jongsuk Yim, Hyunjoong Kim, Sukwhan Kim, Sukho Shin, Woosun Choi, Jinhee Jung, Kyungwha Chun, Inja Lee, Jooyoung Lee, Hyeongsun Hong, and Gyoyoung Jin "A study of reticle CD behavior for inter-area pattern loading difference", Proc. SPIE 9635, Photomask Technology 2015, 96351U (23 October 2015); https://doi.org/10.1117/12.2196988

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