Wafer defect inspection using component tree of SEM images

Sunghyon Kim; Minwoo Kim; Il-suk Oh

doi:10.1117/12.2187411

20 August 2015 Wafer defect inspection using component tree of SEM images

Sunghyon Kim, Minwoo Kim, Il-suk Oh

Proceedings Volume 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII; 95561J (2015) https://doi.org/10.1117/12.2187411
Event: SPIE Nanoscience + Engineering, 2015, San Diego, California, United States

Abstract

This paper proposes a novel defect detection method using component tree of SEM images. The component tree contains rich information about the topological structure of images such as stiffness of intensity changes, area, and volume of lobes. The information is effective in detecting suspicious spot of the defects. A quasi-linear algorithm for constructing the component tree and computing those features is available. This paper modifies the original component tree algorithm to be suitable to the defect detection. One idea is excluding the pixels near the ground level in the initial stage of constructing the component tree. The other idea is to detect significant lobes by using both the volume and area attributes. The experiments performed with actual SEM images and printed electronics images showed promising results. For a 1000*1000 image, the proposed algorithm ran whole process in 1.36 seconds.

Citation Download Citation

Sunghyon Kim, Minwoo Kim, and Il-suk Oh "Wafer defect inspection using component tree of SEM images", Proc. SPIE 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII, 95561J (20 August 2015); https://doi.org/10.1117/12.2187411

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