Presentation + Paper
21 August 2015 Design of SiOx slab optical waveguides
E. G. Lizarraga-Medina, A. Oliver, G. V. Vázquez, R. Salas-Montiel, H. Márquez
Author Affiliations +
Abstract
An analysis of the dispersion relation of SiOx submicron optical waveguides in the visible and IR spectral range is presented. Here is considered that the refractive index (n) of SiOx can be tuned in the range from n=1.457-2 for 2>x>1, and a film thickness from 50nm to 1000nm. Starting from the dispersion relation and the distribution of the electric field in the waveguide; cutoff wavelength, cutoff thickness, effective refractive index, effective guide thickness and confinement factor of a selected mode are calculated.
Conference Presentation
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
E. G. Lizarraga-Medina, A. Oliver, G. V. Vázquez, R. Salas-Montiel, and H. Márquez "Design of SiOx slab optical waveguides", Proc. SPIE 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII, 95560H (21 August 2015); https://doi.org/10.1117/12.2187121
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CITATIONS
Cited by 1 scholarly publication.
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KEYWORDS
Waveguides

Refractive index

Silicon

Silicon films

Dispersion

Thin films

Wave propagation

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