Point-of-use filtration strategy for negative tone developer in extended immersion and extreme-ultraviolet (EUV) lithography

L. D'Urzo; P. Foubert; H. Stokes; Y. Thouroude; A. Xia; Aiwen Wu

doi:10.1117/12.2185599

20 March 2015 Point-of-use filtration strategy for negative tone developer in extended immersion and extreme-ultraviolet (EUV) lithography

L. D'Urzo, P. Foubert, H. Stokes, Y. Thouroude, A. Xia, Aiwen Wu

Author Affiliations +

Proceedings Volume 9425, Advances in Patterning Materials and Processes XXXII; 94251J (2015) https://doi.org/10.1117/12.2185599
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Negative tone development (NTD) has dramatically gained popularity in 193 nm dry and immersion lithography, due to their superior imaging performance [1, 2 and 3].

Popular negative tone developers are organic solvents such as n- butyl acetate (n-BA), aliphatic ketones, or high-density alcohols such as Methyl Isobutyl Carbinol (MIBC). In this work, a comparative study between ultra-high molecular weight polyethylene (UPE) and polytetrafluoroethylene (PTFE) POU filtration for n-BA based NTD has been carried out.

Results correlate with the occurrence or the mitigation of micro bridges in a 45 nm dense line pattern created through immersion lithography as a function of POU membrane.

Citation Download Citation

L. D'Urzo, P. Foubert, H. Stokes, Y. Thouroude, A. Xia, and Aiwen Wu "Point-of-use filtration strategy for negative tone developer in extended immersion and extreme-ultraviolet (EUV) lithography", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94251J (20 March 2015); https://doi.org/10.1117/12.2185599

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