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The CID Number appears on each page of the manuscript. The complete citation is used on the first page, and an abbreviated version on subsequent pages. AuthorsNumbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B...0Z, followed by 10-1Z, 20-2Z, etc. Aissou, K., 0Z Alkemade, Paul, 13 Anderson, Jeremy T., 0S Ann, Chia, 0B Arai, Masatoshi, 0U Arellano, Noel, 0P Asai, Masaya, 0G Ashby, Paul, 0I Balakrishnan, Srinivasan, 0P Baranowski, Paul, 1X Baskaran, Durairaj, 0P Bekaert, Joost, 0Y Bell, William K., 1D Biafore, John J., 07 Bowers, Amy N., 0P Brainard, Robert L., 0T Brewer, Alex J., 19 Brochon, C., 0Z Brown, Alan G., 0L Buch, X., 1Y Budden, Matthias, 0E Cao, Yi, 0X, 18 Chan, Boon Teik, 0N, 0R, 0X, 16 Chandhok, Manish, 0O Chao, Weilun, 0I Chauhan, Vikrant, 0B Chen, Fong, 1Z Cheng, Joy Y., 0P Chevalier, X., 0Z, 1N Cho, David, 0B Cho, JoonYeon, 18 Chuang, Vivian, 1X Chun, Jun Sung, 0A, 0C, 1S, 26 Chunder, Anindarupa, 0P Clark, Benjamin L., 0S, 1A Clark, Michael B., 1X Cloutet, E., 0Z Cooke, Mike, 0E Cummings, Kevin, 26 Cutler, Charlotte, 1X DeKraker, David, 1A Delgadillo, Paulina R., 0R Del Re, Ryan, 0T de Marneffe, Jean- François,0E de Schepper, Peter, 07, 0S De Simone, Danilo, 0S, 16 Dhuey, Scott, 0I Dick, Andrew R., 1D Dioses, Alberto D., 18 Doise, Jan, 0Y Dojun, Makiko, 0Q Dousharm, Levi, 0T Dürig, Urs, 0E D'Urzo, L., 1J, 1Y Echigo, Masatoshi, 1L Edson, Joseph, 0S Ekinci, Yasin, 04, 0T el Otell, Ziad, 0E, 0N Elineni, Kranthi Kumar, 0O Enomoto, Masashi, 1A Erenturk, Burcin, 0B Fan, Yu-Jen, 26 Farrell, Richard, 1A Fernandez-Regulez, M., 0Z Fleury, G., 0Z, 1N Fliervoet, Timon, 0K Fokkema, Vincent, 0E Foubert, P., 1J Fralick, Ashten, 1S Freedman, Daniel A., 0T Friz, Alexander M., 0P Frommhold, Andreas, 04, 0L Fujii, Tatsuya, 0U Fujimori, Toru, 05 Fujita, Mitsuhiro, 09, 0F Furukawa, Kikuo, 1R Furutani, Hajime, 09 Gaikwad, Ashish, 0O Ganta, Lakshmi K., 0B Gao, Tao, 1Z Gharbi, A., 1N Giglia, Angelo, 07 Goto, Akiyoshi, 09 Graves, Trey, 0Y Greer, Michael, 0S, 1A Grenville, Andrew, 0S, 1A Gronheid, Roel, 0N, 0R, 0W, 0X, 0Y Gstrein, Florian, 0O, 16 Hadziioannou, G., 0Z, 1N Han, Eungnak, 0O Hanabata, Makoto, 1P, 1V Hansen, Terje, 07 Hara, Arisa, 02, 0D, 14 Harumoto, Masahiko, 0G Henderson, Clifford L., 0A, 0C, 1S Her, YoungJun, 0W, 18 Hetzer, David, 1A, 26 Higgins, Craig, 0B Hirahara, Eri, 0P Hirayama, Taku, 0U, 17 Hong, SungEun, 0P Horiba, Yuko, 20 Hoshiko, Kenji, 07 Hsu, Ray, 1T Hu, Shan, 1A Huang, Wen Liang, 1T Huang, Yu Chin, 1T Huli, Lior, 1A, 26 Iguchi, Naoya, 21 Iijima, Etsuo, 0Q Iliopoulos, I., 1N Im, Kwang-Hwyi, 1T Inoue, Naoki, 09 Itani, Toshiro, 05, 06, 08, 1I Iwaki, Hiroyuki, 0Q Iwao, Fumiko, 0Q Jen, Shih-Hui, 26 Jeon, Hyun K., 1T Jeong, EunJeong, 0P Jiang, Kai, 0S Kaestner, Marcus, 0E Kalhor, Nima, 13 Kamimura, Sou, 24 Kamizono, Takashi, 0U Kaneyama, Koji, 0G Kashiwakura, Miki, 1P Kato, Keita, 24 Kawakami, Shinichiro, 0Q, 1A Kawana, Daisuke, 0U Kawaue, Akiya, 0U, 17 Kim, Jihoon, 0P, 0W Kimura, Tooru, 22 Kinuta, Takafumi, 20 Kitano, Takahiro, 0Q Knaepen, Werner, 0N Knoll, Armin, 0E Knops, Roel, 0K Kocsis, Michael, 0S, 1A Koh, Hui Peng, 0B Kohl, Paul A., 1D Koike, Kyohei, 02, 0D, 14 Kolb, Tristan, 0E Komuro, Yoshitaka, 0U, 17 Kozawa, Takahiro, 1P, 1R Krivoshapkina, Yana, 0E Kulshreshtha, Prashant, 0I Kuo, Chien Wen, 1T Kurosawa, Tsuyoshi, 17 Kuwahara, Yuhei, 16 Lada, Tom, 0L Lauerhaas, Jeffrey, 1A Law, Alman, 19 Lawson, Richard A., 0A, 0C, 1S Leeson, Michael J., 16 Leonard, JoAnne, 1X Li, Bifeng, 1Z Li, Mingqi, 1X Lim, Hae Jin, 1T Lin, Chia Hung, 1T Lin, Guanyang, 0P, 0W Lin, Jeff, 1T Lin, Yeh-Sheng, 1T Liu, Chi-Chun, 0P Liu, Cong, 1X Liu, Lian Cong, 1T Liu, Yansong, 1Z Liu, Zhimin, 1Z Lofano, Elizabeth, 0P Lorusso, Gian F., 0K Luke, Brendan, 1D Maas, Diederik, 13 Mack, Chris A., 0J Maehashi, Takaya, 17 Maes, Jan Willem, 0N Maines, Erin, 1D Makinoshima, Takashi, 1L Man, Naoki, 1H, 22 Mani, Antonio, 07 Mao, Ming, 0K Maruyama, Ken, 0I Marzook, Taisir, 0R Matsumaru, Shogo, 0U Matsumiya, Tasuku, 17 Matsumoto, Hiroie, 1A, 26 Matsumoto, Yoko, 1H Matsunaga, Koichi, 1A Matsuzawa, Kensuke, 1Q Mattia, Joe, 1X McClelland, Alexandra, 04 McKenzie, Douglas, 18 Mehta, Sohan S., 0B Mesch, Ryan, 1Q Metz, Andrew, 1A, 26 Meyers, Stephen T., 0S Minegishi, Shinya, 1I Miyagi, Ken, 17 Miyagi, Tadashi, 0G Miyamoto, Yoshihiro, 20 Mizusaka, Tetsuhiko, 1R Mochida, Kenji, 22 Montgomery, Cecilia, 26 Montgomery, Warren, 26 Moore, John C., 19 Morita, Hiroshi, 10 Mueller, Brennan, 1D Mulckhuyse, Wouter, 13 Mullen, Salem, 18 Mumtaz, M., 0Z Muramatsu, Makoto, 0Q Murphy, Michael, 0T Myers, Alan M., 0O Nafus, Kathleen, 0Q, 16 Nagahara, Seiji, 0Q Nagahara, Tatsuro, 20 Nakamura, Shinichi, 22 Nakano, Takeo, 0Q Narcross, Hannah, 0A, 0C, 1S Natori, Sakurako, 02, 0D, 14 Navarro, C., 0Z, 1N Nealey, Paul, 0W Neisser, Mark, 0A, 0C, 0T, 1S, 26 Neuber, Christian, 0E Ng, Edward, 0P Nguyen, Khanh, 0P Nicolet, C., 0Z, 1N Nishi, Takanori, 0Q Norizoe, Yuki, 10 Nyhus, Paul A., 0O O'Connell, Kathleen, 1X Ohmori, Katsumi, 0U, 17 Okabe, Noriaki, 02, 0D, 14 Okada, Soichiro, 0Q Olah, Michael, 1Q Olynick, Deirdre, 0I Onishi, Ryuji, 12 Oshima, Akihiro, 1P Ou, Keiyu, 24 Ou, Keiyu, 24 Oyama, Kenichi, 02, 0D, 14 Padmanaban, Munirathna, 18 Palmer, Richard E., 04, 0L Parnell, Doni, 0Q, 0X Passarelli, James, 0T Paunescu, Margareta, 0P Petermann, Claire, 18 Pettit, Jared M., 19 Peyre, Jean-Luc, 0Q Phillips, Scott T., 1Q Pieczulewski, Charles, 0G Pimenta-Barros, P., 0Z, 1N Polishchuk, Orest, 0P Rahman, Dalil, 18 Rangelow, Ivo W., 0E Rastogi, Vinayak, 0Q, 26 Rathsack, Benjamen, 0Q Ratkovich, Anthony, 1A Rawlings, Brandon, 1D Rawlings, Colin, 0E Reijnen, Liesbeth, 0K Rettner, Charles T., 0P Ringk, Andreas, 0E Rispens, Gijsbert, 0K Robertson, Stewart, 0Y Robinson, Alex P. G., 04, 0L Romo Negreira, Ainhoa, 0Q Rosamund, Mark C., 04 Roth, John, 04 Sagan, John, 20 Saito, Takashi, 1A, 26 Sakai, Kazunori, 22 Sakamoto, Rikimaru, 12 Sanchez, Efrain A., 0R Sanders, Daniel P., 0P Santillan, Julius Joseph, 06 Sato, Takashi, 1L Sayan, Safak, 0N, 0R, 16 Schedl, Andreas, 0E Schmidt, Hans-Werner, 0E Schollaert, W. 1Y Seidel, Robert, 0W Seki, Hirofumi, 22 Sekiguchi, Atsushi, 1H Sekito, Takashi, 20 Setu, Praveen K., 0O Shan, Jianhui, 0P Sharp, Brandon, 0A, 0C, 1S Shichiri, Motoharu, 06 Shigaki, Shuhei, 12 Shirakawa, Michihiro, 09, 0F, 24 Singh, Arjun, 0N, 0R, 0X, 16 Singh, Paramjit, 0B Singh, Sunil, 0B Smith, Mark, 0Y Somervell, Mark, 0Q Sortland, Miriam, 0T Srivastava, Ravi, 0B Stokes, Harold, 0G, 1J, 1Y Stowers, Jason K., 0S Strohriegl, Peter, 0E Su, Xiaojing, 1Z Su, Yajuan, 1Z Subramany, Lokesh, 0B Suzuki, Akihiro, 1L Suzuki, Issei, 17 Suzuki, Kenta, 0U Suzuki, Yasuhiro, 1T Tagawa, Seiichi, 1P Takasuka, Masaaki, 1L Takeda, Masaaki, 22 Takei, Satoshi, 1M, 1P, 1V Tanagi, Hiroyuki, 1R Tanaka, Hiroyasu, 1R Tanaka, Yuji, 0G Tao, Zheng, 16 Tarutani, Shinji, 20 Telecky, Alan J., 0S Thouroude, Y., 1J, 1Y Tiron, R., 0Z, 1N Tjio, Melia, 0P Tobana, Toshikatsu, 0Q Toida, Takumi, 1L Tolbert, Laren M., 0A, 0C, 1S Tomita, Tadatoshi, 0Q Toriumi, Minoru, 08 Trefonas, Peter, 1X Tronic, Tristan A., 0O Tsai, Hsinyu, 0P Tsuchihashi, Toru, 05 Tsuzuki, Shuichi, 21 Uchiyama, Naoya, 1L Umeda, Toru, 21 Vaglio Pret, Alessandro, 07, 0Y Vandenberghe, Geert, 0S, 16 Vandenbroeck, Nadia, 0R van Veghel, Marijn G. A., 0E Viatkina, Katja, 0K Vockenhuber, Michaela, 0T Vora, Ankit, 0P Wallace, Charles H., 0O Wan, I-Yuan, 1T Wang, Deyan, 1X Wang, Wade, 1Q Wei, Yayi, 1Z Williamson, Lance, 0W Williams, William, 1X Willson, C. Grant, 1D, 1Q Wolfer, Elizabeth, 18 Wong, Sabrina, 1X Wu, Aiwen, 1J Wu, Hengpeng, 0X Wu, Yixu, 0B Xia, A., 1J Xu, Cheng Bai, 1T, 1X Yaegashi, Hidetami, 02, 0D, 14 Yahagi, Masahito, 17 Yamada, Shintaro, 1X Yamaguchi, Shuhei, 0F Yamamoto, Hiroki, 1R Yamamoto, Kei, 09, 24 Yamanaka, Tsukasa, 21 Yamano, Hitoshi, 17 Yamato, Masatoshi, 02, 0D, 14 Yamauchi, Shouhei, 02, 0D, 14 Yamauchi, Takashi, 0Q Yamazaki, Hiroto, 0U Yang, Dongxu, 04 Yao, Huirong, 18 Yatsuda, Kochi, 0Q Yeh, Tsung Ju, 1T Yin, Jian, 0X Yoshida, Jun-ichi, 0G Yoshikawa, Kazuhiro, 22 Younkin, Todd R., 0O Yu, Chun Chi, 1T Zhang, Wei, 1Z Ziegler, Dominik, 0I Session Chairs1 Keynote Session 2 EUV Resist Extendability: Joint Session with Conferences 9422 and 9425 Robert L. Brainard, College of Nanoscale Science and Engineering (United States) James W. Thackeray, Dow Electronic Materials (United States)
3 EUV Resist Mechanistic Studies: Joint Session with Conferences 9422 and 9425 John J. Biafore, KLA-Tencor Texas (United States) Robert Allen, IBM Research - Almaden (United States)
4 4 Negative Tone Materials Yoshio Kawai, Shin-Etsu Chemical Company, Ltd. (Japan) Clifford L. Henderson, Georgia Institute of Technology (United States)
5 Resist and Process Fundamentals Ralph R. Dammel, EMD Performance Materials Corporation (United States) Robert Allen, IBM Research - Almaden (United States)
6 Patterning Materials and Etch: Joint Session with Conferences 9425 and 9428 Qinghuang Lin, IBM Thomas J. Watson Research Center (United States) Douglas Guerrero, Brewer Science, Inc. (United States)
7 Materials and Etch in Emerging Technologies: Joint Session with Conferences 9425 and 9428 Christoph K. Hohle, Fraunhofer Institute for Photonic Microsystems (Germany) Qinghuang Lin, IBM Thomas J. Watson Research Center (United States)
8 DSA Materials and Processes I: Joint Session with Conferences 9425 and 9423 Juan J. de Pablo, The University of Chicago (United States) Roel Gronheid, IMEC (Belgium)
9 DSA Materials and Processes II: Joint Session with Conferences 9425 and 9423 Todd R. Younkin, Intel Corporation (United States) Sean D. Burns, IBM Corporation (United States)
10 EUV Resists and Processes Katsumi Ohmori, Tokyo Ohka Kogyo Company, Ltd. (Japan) Ramakrishnan Ayothi, JSR Micro, Inc. (United States)
11 DSA Materials and New Concepts Mark H. Somervell, Tokyo Electron America, Inc. (United States) Daniel P. Sanders, IBM Research - Almaden (United States)
12 New Patterning Processes Ralph R. Dammel, EMD Performance Materials Corporation (United States) Scott W. Jessen, Texas Instruments Inc. (United States)
13 Materials and Process Engineering Thomas I. Wallow, ASML Brion Technologies (United States) Clifford L. Henderson, Georgia Institute of Technology (United States)
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