Research on mid-frequency errors in Nd-doped glass continuous polishing

Jun Cao; Aihuan Dun; Chaoyang Wei; Jianxun Gu; Jianda Shao

doi:10.1117/12.2069765

6 August 2014 Research on mid-frequency errors in Nd-doped glass continuous polishing

Jun Cao, Aihuan Dun, Chaoyang Wei, Jianxun Gu, Jianda Shao

Proceedings Volume 9281, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 92810K (2014) https://doi.org/10.1117/12.2069765
Event: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2014), 2014, Harbin, China

Abstract

In the inertial confinement fusion (ICF) system, the mid-frequency errors of optical components will cause high-frequency modulation and nonlinear gain of laser beams. In this paper, theoretical simulations and experiments have been designed and operated, aiming at studying the effects of slotting methods on mid-frequency errors in Nd-doped glass continuous polishing. Based on Preston formula, theoretical simulations focus on the effects of slotting methods on the mid-frequency errors. The simulation results show that different slotting methods will cause different mid-frequency errors, and square and logarithmic shape grooves are easier to obtain smaller mid-frequency errors. On the basis of simulation results, two groups of experiments are carried out to do the Nd-doped glass continuous polishing. The results show that the mid-frequency error gradually decreases with the decrease of the spacing between grooves. The results also show that square shape groove is easier to get a smaller mid-frequency error than circular shape groove, which verifies the theoretical simulation results.

Citation Download Citation

Jun Cao, Aihuan Dun, Chaoyang Wei, Jianxun Gu, and Jianda Shao "Research on mid-frequency errors in Nd-doped glass continuous polishing", Proc. SPIE 9281, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 92810K (6 August 2014); https://doi.org/10.1117/12.2069765

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KEYWORDS

Polishing

Glasses

Surface finishing

Optical components

Error analysis

Polishing equipment

Semiconducting wafers

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