Formation of sub-wavelength pitch regular structures employing a motorized multiple exposure Lloyd's mirror holographic lithography setup

Dainius Virganavičius; Linas Šimatonis; Aušrine Jurkevičiūtė; Tomas Tamulevičius; Sigitas Tamulevičius

doi:10.1117/12.2061191

28 August 2014 Formation of sub-wavelength pitch regular structures employing a motorized multiple exposure Lloyd's mirror holographic lithography setup

Dainius Virganavičius, Linas Šimatonis, Aušrine Jurkevičiūtė, Tomas Tamulevičius, Sigitas Tamulevičius

Author Affiliations +

Proceedings Volume 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI; 91701I (2014) https://doi.org/10.1117/12.2061191
Event: SPIE NanoScience + Engineering, 2014, San Diego, California, United States

Abstract

This paper presents a custom designed, fully automated UV holographic lithography system based on Lloyd‘s mirror interferometer geometry. This system was used to record large area (50×50 mm²) 1D and 2D periodic patterns with periodicity of 288 nm in a positive tone photoresist layer spin coated on crystalline silicon substrate. Produced structures were investigated with atomic force and scanning electron microscopes.

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Dainius Virganavičius, Linas Šimatonis, Aušrine Jurkevičiūtė, Tomas Tamulevičius, and Sigitas Tamulevičius "Formation of sub-wavelength pitch regular structures employing a motorized multiple exposure Lloyd's mirror holographic lithography setup", Proc. SPIE 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI, 91701I (28 August 2014); https://doi.org/10.1117/12.2061191

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