AZO electrodes deposited by atomic layer deposition for OLED fabrication

B. Dugrenil; I. Séguy; Hsin-Ying Lee; T. Camps; Y.-C. Lin; J. B. Doucet; Y.-S. Chiu; L. Salvagnac; E. Bedel-Pereira; M. Ternisien; C. T. Lee; V. Bardinal

doi:10.1117/12.2052504

1 May 2014 AZO electrodes deposited by atomic layer deposition for OLED fabrication

B. Dugrenil, I. Séguy, Hsin-Ying Lee, T. Camps, Y.-C. Lin, J. B. Doucet, Y.-S. Chiu, L. Salvagnac, E. Bedel-Pereira, M. Ternisien, C. T. Lee, V. Bardinal

Author Affiliations +

Proceedings Volume 9137, Organic Photonics VI; 91371D (2014) https://doi.org/10.1117/12.2052504
Event: SPIE Photonics Europe, 2014, Brussels, Belgium

Abstract

In this work, we present a comparative study of optimized AZO electrodes deposited by Atomic Layer Deposition (ALD) with commercial ITO in terms of electrical, optical and structural properties. Despite a lower figure of merit mainly due to a higher sheet resistance, AZO-based OLEDs are shown to present a current density five times higher than ITO-based ones for the same applied voltage. These AZO electrodes fabricated by ALD could thus be promising substitutes for conventional ITO anodes in organic electronic devices.

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B. Dugrenil, I. Séguy, Hsin-Ying Lee, T. Camps, Y.-C. Lin, J. B. Doucet, Y.-S. Chiu, L. Salvagnac, E. Bedel-Pereira, M. Ternisien, C. T. Lee, and V. Bardinal "AZO electrodes deposited by atomic layer deposition for OLED fabrication", Proc. SPIE 9137, Organic Photonics VI, 91371D (1 May 2014); https://doi.org/10.1117/12.2052504

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