A temperature control algorithm of immersion liquid for immersion lithography

Junwei He; Xiaoping Li; Min Lei; Bing Chen; Jinchun Wang

doi:10.1117/12.2046080

31 March 2014 A temperature control algorithm of immersion liquid for immersion lithography

Junwei He, Xiaoping Li, Min Lei, Bing Chen, Jinchun Wang

Proceedings Volume 9052, Optical Microlithography XXVII; 90522F (2014) https://doi.org/10.1117/12.2046080
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Immersion lithography is one of the main technologies used to manufacture integrated circuits with the shortest feature size. In immersion lithography, temperature of immersion liquid is strictly constrained and its allowable range is less than ±0.01°C at 22°C. To meet this requirement, a temperature control algorithm adopted by the test rig which controls the temperature of the immersion liquid with process cooling water (PCW) via heat exchangers is proposed. By adjusting the flow rate of PCW through the heat exchangers, the control system varies the amount of heat exchanged, and the temperature of the immersion liquid can be properly controlled. The temperature control rig is a multi-disturbed, timevariant, non-linear and time-delayed system and its transfer function varies with the inlet temperature and flow rates of the streams through the heat exchangers. Considering the characteristics of the system, a cascade-connected fuzzy PID feedback algorithm is designed.

Citation Download Citation

Junwei He, Xiaoping Li, Min Lei, Bing Chen, and Jinchun Wang "A temperature control algorithm of immersion liquid for immersion lithography", Proc. SPIE 9052, Optical Microlithography XXVII, 90522F (31 March 2014); https://doi.org/10.1117/12.2046080

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