Mean offset optimization for multi-patterning overlay using Monte Carlo simulation method

Wenhui Wang; Liping Cui; Lei Sun; Ryoung-Han Kim

doi:10.1117/12.2046580

2 April 2014 Mean offset optimization for multi-patterning overlay using Monte Carlo simulation method

Wenhui Wang, Liping Cui, Lei Sun, Ryoung-Han Kim

Proceedings Volume 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII; 90502O (2014) https://doi.org/10.1117/12.2046580
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

The overlay performance and alignment strategy optimization for a triple patterning (LELELE) were studied based on the Monte Carlo simulation method. The simulated results show that all of the combined or worst case overlay, alignment strategy, mean target of the upper level, and mean tolerance of the lower level are dependent on the means of the lower level. A dynamic mean control method is proposed to be integrated into the APC system to improve the overlay performance.

Citation Download Citation

Wenhui Wang, Liping Cui, Lei Sun, and Ryoung-Han Kim "Mean offset optimization for multi-patterning overlay using Monte Carlo simulation method", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90502O (2 April 2014); https://doi.org/10.1117/12.2046580

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