Lithography run-to-run control in high mix manufacturing environment with a dynamic state estimation approach

Mark E. Yelverton; Gaurav K. Agrawal

doi:10.1117/12.2046331

2 April 2014 Lithography run-to-run control in high mix manufacturing environment with a dynamic state estimation approach

Mark E. Yelverton, Gaurav K. Agrawal

Author Affiliations +

Proceedings Volume 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII; 90500Q (2014) https://doi.org/10.1117/12.2046331
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

The quest to create robust control solutions for Photolithography processes is an ongoing matter. Over the past few decades several threaded and non-threaded Run-to-Run (RtR) control solutions have been introduced addressing various specific Lithography process control requirements. With continually shrinking semiconductor technology nodes, greater interdependencies are being observed between processes requiring more complex control solutions that rely on increasing process context. With higher product mixes, associated metrology costs add to this growing complexity in using existing control solutions effectively. A new dynamic RtR control solution approach in GLOBALFOUNDRIES high mix manufacturing environment offering coverage to all Lithography process steps in Fab8 has been architected and implemented. This approach not only addresses the issues caused in most commonly used ‘Threaded’ and ‘Non-Threaded’ control approaches in Lithography but also offers a dynamic thread definition implementation approach.

Citation Download Citation

Mark E. Yelverton and Gaurav K. Agrawal "Lithography run-to-run control in high mix manufacturing environment with a dynamic state estimation approach", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90500Q (2 April 2014); https://doi.org/10.1117/12.2046331

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