Materials Surface Processing With Excimer Lasers

David J Elliott; Bernhard P Piwczyk

doi:10.1117/12.944387

12 July 1988 Materials Surface Processing With Excimer Lasers

David J Elliott, Bernhard P Piwczyk

Proceedings Volume 0894, Gas Laser Technology; (1988) https://doi.org/10.1117/12.944387
Event: 1988 Los Angeles Symposium: O-E/LASE '88, 1988, Los Angeles, CA, United States

Abstract

The evolution of the excimer laser from a research tool in the 1970's to the industrial models of the 1980's has opened up numerous applications in semiconductor manufacturing, corneal surgery genetic research and material processing in many fields. Microprocessor controlled laser systems, including computer-controlled delivery systems, will now run for up to 50 million shots before undergoing scheduled maintenance. The energy is delivered to a tolerance of +10% in most cases. While many uses for the excimer laser are still research oriented, the production applications are rapidly emerging. The continued reduction of VLSI circuit geometries together with increasingly higher levels of circuit integration create the demand for new circuit fabrication technologies. One of limitations of current IC fabrication technology is the use of high temperature processing. High temperatures distort silicon wafers, causing loss of resolution and alignment control and a subsequent reduction of device yield. Excimer laser technology, at very short ultra-violet wavelengths, offers the possibility of low temperature processing, including the following major applications: Photoresist exposure, photoresist ablation over alignment marks, annealing and doping, and etching. In addition, applications in IC packaging, circuit personalization and fiber optics appear as very promising new applications for excimer laser technology in the electronics industry.

Citation Download Citation

David J Elliott and Bernhard P Piwczyk "Materials Surface Processing With Excimer Lasers", Proc. SPIE 0894, Gas Laser Technology, (12 July 1988); https://doi.org/10.1117/12.944387

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available