Chemical etching process for PANDA polarization-maintaining fiber in HiBi fiber loop mirror

Jing Wang; Ciming Zhou; Angui Zheng

doi:10.1117/12.2031659

15 October 2013 Chemical etching process for PANDA polarization-maintaining fiber in HiBi fiber loop mirror

Jing Wang, Ciming Zhou, Angui Zheng

Proceedings Volume 8924, Fourth Asia Pacific Optical Sensors Conference; 89242T (2013) https://doi.org/10.1117/12.2031659
Event: Asia Pacific Optical Sensors Conference 2013, 2013, Wuhan, China

Abstract

Chemical etching process for PANDA polarization-maintaining fiber (PMF) in HiBi fiber loop mirror (FLM) is studied detailedly in this paper. The PMF is inserted into the FLM whose etched length is about 3cm. Due to decrease of the fiber diameter, the whole wavelengths of transmission dips shift to the short wavelength because of the reduction of birefringence when the PMF is etched. The result shows that the wavelength spacing between two interference minima increases from 19nm to 22nm when chemical etching ends, the thinned PMF is sensitive to the external environment and can be applied to many biochemistry sensing applications.

Citation Download Citation

Jing Wang, Ciming Zhou, and Angui Zheng "Chemical etching process for PANDA polarization-maintaining fiber in HiBi fiber loop mirror", Proc. SPIE 8924, Fourth Asia Pacific Optical Sensors Conference, 89242T (15 October 2013); https://doi.org/10.1117/12.2031659

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