Error analysis for aspheric surface testing system

Jie Feng; Chao Deng; Tingwen Xing

doi:10.1117/12.2034884

23 August 2013 Error analysis for aspheric surface testing system

Jie Feng, Chao Deng, Tingwen Xing

Proceedings Volume 8911, International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications; 89110V (2013) https://doi.org/10.1117/12.2034884
Event: ISPDI 2013 - Fifth International Symposium on Photoelectronic Detection and Imaging, 2013, Beijing, China

Abstract

Computer-generated holograms (CGHs) are commonly used in optical interferometry for producing reference wavefronts with desired shapes. Uncertainties from the computer generated hologram (CGH) manufacturing processes produce errors in the finished hologram and the generated reference wavefront. CGH errors compromise the accuracy of the interferometric measurements. Although errors in the CGHs may be introduced during either the design or the fabrication process, fabrication uncertainties are mostly responsible for the degradation of the quality of CGHs. To specify and verify detection accuracy of aspheric surface testing system, alignment errors and fabrication errors of the CGHs will be analyzed. Methods are discussed for measuring the fabrication errors in the CGH substrate, duty cycle, etching depth, and effect of surface roughness. An example analysis of the wavefront errors from fabrication nonuniformities for a phase CGH is given.

Citation Download Citation

Jie Feng, Chao Deng, and Tingwen Xing "Error analysis for aspheric surface testing system", Proc. SPIE 8911, International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications, 89110V (23 August 2013); https://doi.org/10.1117/12.2034884

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KEYWORDS

Computer generated holography

Wavefronts

Error analysis

Etching

Optical fabrication

Distortion

Diffraction

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