Design considerations for monolithic beam formers based on electro-optic polymer phase modulators and strain-induced optical waveguides

Richard S. Kim; Attila Szep; Nicholas G. Usechak; YoungHwan You

doi:10.1117/12.2022639

10 September 2013 Design considerations for monolithic beam formers based on electro-optic polymer phase modulators and strain-induced optical waveguides

Richard S. Kim, Attila Szep, Nicholas G. Usechak, YoungHwan You

Author Affiliations +

Proceedings Volume 8827, Optical Processes in Organic Materials and Nanostructures II; 88270M (2013) https://doi.org/10.1117/12.2022639
Event: SPIE Organic Photonics + Electronics, 2013, San Diego, California, United States

Abstract

The fabrication and characterization of a 1×4-element integrated beam former based on electro-optic (EO) polymer phase modulators (PM) is summarized including findings related to waveguide loss, near-, and far-field diffraction patterns. Based on this device, two alternate designs are proposed to improve performance: an unequally spaced 1×4- element and an equally spaced 1×8-element beam former both based on EO polymer PMs. Models of these alternative designs indicate that waveguide propagation loss and strong grating lobes, both of which degraded the performance of the initial device, can be substantially improved. The proposed approach explored by the 8-element beam former introduces novel components including strain-induced optical waveguides, hybrid integration of active and passive polymers, modified waveguide diffraction aperture, and directional coupler thermo-optic (TO) switches.

Citation Download Citation

Richard S. Kim, Attila Szep, Nicholas G. Usechak, and YoungHwan You "Design considerations for monolithic beam formers based on electro-optic polymer phase modulators and strain-induced optical waveguides", Proc. SPIE 8827, Optical Processes in Organic Materials and Nanostructures II, 88270M (10 September 2013); https://doi.org/10.1117/12.2022639

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