Paper
9 July 2013 Effect of laser conditioning on the LIDT of 532nm HfO2/SiO2 reflectors
Jie Liu, Xu Li, Zhenkun Yu, Hui Cui, Weili Zhang, Meiping Zhu, Kui Yi
Author Affiliations +
Proceedings Volume 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers; 87860Z (2013) https://doi.org/10.1117/12.2020439
Event: SPIE/SIOM Pacific Rim Laser Damage: Optical Materials for High-Power Lasers, 2013, Shanghai, China
Abstract
The laser-induced damage threshold (LIDT) of optical thin film is influenced by certain preconditioning processes. HfO2/SiO2 532nm high reflective multi-layers were prepared by electron beam evaporation and were preconditioned by 532nm laser. The 532nm LIDT, surface condition, and damage morphology of the sample were characterized and compared before and after laser conditioning process. Results are presented that the LIDT of e-beam deposited multilayer HfO2/SiO2 thin films can be increased after laser conditioning. Possible reasons for such enhancement have been analyzed.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jie Liu, Xu Li, Zhenkun Yu, Hui Cui, Weili Zhang, Meiping Zhu, and Kui Yi "Effect of laser conditioning on the LIDT of 532nm HfO2/SiO2 reflectors", Proc. SPIE 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers, 87860Z (9 July 2013); https://doi.org/10.1117/12.2020439
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KEYWORDS
Thin films

Laser induced damage

Reflectors

Laser damage threshold

Raster graphics

Resistance

Thin film coatings

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