Self-aligned double patterning compliant routing with in-design physical verification flow

Jhih-Rong Gao; Harshdeep Jawandha; Prasad Atkar; Atul Walimbe; Bikram Baidya; Olivier Rizzo; David Z. Pan

doi:10.1117/12.2013245

29 March 2013 Self-aligned double patterning compliant routing with in-design physical verification flow

Jhih-Rong Gao, Harshdeep Jawandha, Prasad Atkar, Atul Walimbe, Bikram Baidya, Olivier Rizzo, David Z. Pan

Proceedings Volume 8684, Design for Manufacturability through Design-Process Integration VII; 868408 (2013) https://doi.org/10.1117/12.2013245
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Among double patterning techniques, Self-aligned double patterning (SADP) has the advantage of good mask overlay control, which has made SADP a popular double patterning method for sub-32nm technology nodes. However, SADP process places several limitations on design flexibility. This work exploits an alternative post routing approach that has the flexibility to resolve lithography violations without the overhead of repeated rule checking. In addition, it allows for successive refinement in the definition of lithographic violations as the process node matures, and implementation of fixes as localized ECO (Engineering Change Order) operations without needing to reroute the complete design.

Citation Download Citation

Jhih-Rong Gao, Harshdeep Jawandha, Prasad Atkar, Atul Walimbe, Bikram Baidya, Olivier Rizzo, and David Z. Pan "Self-aligned double patterning compliant routing with in-design physical verification flow", Proc. SPIE 8684, Design for Manufacturability through Design-Process Integration VII, 868408 (29 March 2013); https://doi.org/10.1117/12.2013245

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