Global source optimization for MEEF and OPE

Ryota Matsui; Tomoya Noda; Hajime Aoyama; Naonori Kita; Tomoyuki Matsuyama; Donis Flagello

doi:10.1117/12.2008267

12 April 2013 Global source optimization for MEEF and OPE

Ryota Matsui, Tomoya Noda, Hajime Aoyama, Naonori Kita, Tomoyuki Matsuyama, Donis Flagello

Proceedings Volume 8683, Optical Microlithography XXVI; 86830O (2013) https://doi.org/10.1117/12.2008267
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

This work describes freeform source optimization considering mask error enhancement factor (MEEF), optical proximity effect (OPE), process window, and hardware-specific constraints. Our algorithm allows users to define maximum allowed MEEF and OPE error as constraints without defining weights among the metrics. We also consider hardware specific constraints, so that the optimized source is suitable to be realized in Nikon’s Intelligent Illumination hardware. Our approach utilizes a global optimization procedure to arrive at a freeform source shape solution, and since each source grid-point is assigned as variable, the source solution encompasses the maximum amount of degrees of freedom.

Citation Download Citation

Ryota Matsui, Tomoya Noda, Hajime Aoyama, Naonori Kita, Tomoyuki Matsuyama, and Donis Flagello "Global source optimization for MEEF and OPE", Proc. SPIE 8683, Optical Microlithography XXVI, 86830O (12 April 2013); https://doi.org/10.1117/12.2008267

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