Paper
10 April 2013 Hybrid approach to optical CD metrology of directed self-assembly lithography
Stephane Godny, Masafumi Asano, Akiko Kawamoto, Koichi Wakamoto, Kazuto Matsuki, Cornel Bozdog, Matthew Sendelbach, Igor Turovets, Ronen Urenski, Renan Milo
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Abstract
Directed Self Assembly (DSA) for contact layers is a challenging process in need of reliable metrology for tight process control. Key parameters of interest are guide CD, polymer CD, and residual polymer thickness at the bottom of the guide cavity. We show that Optical CD (OCD) provides the needed performance for DSA contact metrology. The measurement, done with a multi-channel spectroscopic reflectometry (SR) system, is enhanced through elements of a Holistic Metrology approach such as Injection and Hybrid Metrology.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephane Godny, Masafumi Asano, Akiko Kawamoto, Koichi Wakamoto, Kazuto Matsuki, Cornel Bozdog, Matthew Sendelbach, Igor Turovets, Ronen Urenski, and Renan Milo "Hybrid approach to optical CD metrology of directed self-assembly lithography", Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86812D (10 April 2013); https://doi.org/10.1117/12.2012660
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CITATIONS
Cited by 8 scholarly publications and 1 patent.
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KEYWORDS
Metrology

Critical dimension metrology

Directed self assembly

Scanning transmission electron microscopy

Semiconducting wafers

Lithography

Polymers

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