Study of overlay in EUV/ArF mix and match lithography

Chin-Chou Kevin Huang; Lin Chua; KyungBae Hwang; Antonio Mani; Gino Marcuccilli; Bill Pierson; Ramkumar Karur-Shanmugam; John C. Robinson; Dongsub Choi; Michael Ferber; Klaus-Dieter Roeth; ByoungHoon Lee; Inhwan Lee

doi:10.1117/12.2011510

18 April 2013 Study of overlay in EUV/ArF mix and match lithography

Chin-Chou Kevin Huang, Lin Chua, KyungBae Hwang, Antonio Mani, Gino Marcuccilli, Bill Pierson, Ramkumar Karur-Shanmugam, John C. Robinson, Dongsub Choi, Michael Ferber, Klaus-Dieter Roeth, ByoungHoon Lee, Inhwan Lee

Author Affiliations +

Proceedings Volume 8681, Metrology, Inspection, and Process Control for Microlithography XXVII; 86811O (2013) https://doi.org/10.1117/12.2011510
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

In preparation for EUV lithography (EUVL) in high volume manufacturing, a preproduction ASML NXE:3100 step-and- scan system was used to assess overlay performance under mix-and-match between EUV and ArF lithography, which will be critical for the successful insertion of EUV lithography into high volume 1x node production. Overlay sources of variation associated with EUV were investigated, including mask pattern-placement error (PPE), scan direction, and processing order. Furthermore, this study also looks into overlay control strategy development specifically for EUV/ArF mix-and-match lithography. Systematic and random overlay components will be discussed, as well as possible overlay modeling and control options.

Citation Download Citation

Chin-Chou Kevin Huang, Lin Chua, KyungBae Hwang, Antonio Mani, Gino Marcuccilli, Bill Pierson, Ramkumar Karur-Shanmugam, John C. Robinson, Dongsub Choi, Michael Ferber, Klaus-Dieter Roeth, ByoungHoon Lee, and Inhwan Lee "Study of overlay in EUV/ArF mix and match lithography", Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86811O (18 April 2013); https://doi.org/10.1117/12.2011510

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available