Relation between sensitivity and resolution in polymer bound PAGs and polymer blend PAGs

Satoshi Enomoto; Tuan Nguyen Dang; Cong Que Dinh; Seiichi Tagawa

doi:10.1117/12.2011650

1 April 2013 Relation between sensitivity and resolution in polymer bound PAGs and polymer blend PAGs

Satoshi Enomoto, Tuan Nguyen Dang, Cong Que Dinh, Seiichi Tagawa

Proceedings Volume 8679, Extreme Ultraviolet (EUV) Lithography IV; 867926 (2013) https://doi.org/10.1117/12.2011650
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Recently, polymer-bound PAGs (anion bound) are actively investigated as Extreme ultra violet (EUV) resist. Some experimental results showed, in case of shot diffusion length acid generator bounded polymer showed lower sensitivity comparing with long diffusion length acid generator. In our previous investigation, short diffusion length PAG reactivity is changed due to binding to polymer by pulse radiolysis method. However, shot diffusion PAG bound to polymer showed lower LWR than long diffusion length PAG. Therefore, acid diffusion length difference originate in PAG is important to resist performance. The diffusion length difference influence deprotection reaction in PEB process. In this paper, we evaluated polymer-bound PAGs and polymer blend PAGs by electron beam (EB) exposure tool employing various PEB temperature and PEB time to conform the influence of acid diffusion regulation about polymer-bound PAGs for resist performances. As the result, even if acid generator bound polymer applied as a resist, acid diffusion regulation isn’t so strict that acid can migrate in the polymer matrix during PEB.

Citation Download Citation

Satoshi Enomoto, Tuan Nguyen Dang, Cong Que Dinh, and Seiichi Tagawa "Relation between sensitivity and resolution in polymer bound PAGs and polymer blend PAGs", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867926 (1 April 2013); https://doi.org/10.1117/12.2011650

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KEYWORDS

Polymers

Diffusion

Extreme ultraviolet

Lithography

Extreme ultraviolet lithography

Line width roughness

Optical lithography

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