Nanosecond laser annealing to decrease the damage of picosecond laser ablation of anti-reflection layers on textured silicon surfaces

Andreas A. Brand; Annerose Knorz; Ralf Zeidler; Jan-Frederik Nekarda; Ralf Preu

doi:10.1117/12.930491

12 October 2012 Nanosecond laser annealing to decrease the damage of picosecond laser ablation of anti-reflection layers on textured silicon surfaces

Andreas A. Brand, Annerose Knorz, Ralf Zeidler, Jan-Frederik Nekarda, Ralf Preu

Author Affiliations +

Proceedings Volume 8473, Laser Material Processing for Solar Energy; 84730D (2012) https://doi.org/10.1117/12.930491
Event: SPIE Solar Energy + Technology, 2012, San Diego, California, United States

Abstract

This work discusses the impact of laser annealing on a picosecond laser ablation process of anti-reflection layers on damage etched and random pyramid textured silicon wafers. The laser ablation is realized using picosecond pulsed laser radiation which facilitates a continuously ablated passivation layer but induces a significant reduction in charge carrier lifetime. It is demonstrated that the application of a nanosecond pulsed laser annealing step can improve the electrical properties of the picosecond laser treated area.

Citation Download Citation

Andreas A. Brand, Annerose Knorz, Ralf Zeidler, Jan-Frederik Nekarda, and Ralf Preu "Nanosecond laser annealing to decrease the damage of picosecond laser ablation of anti-reflection layers on textured silicon surfaces", Proc. SPIE 8473, Laser Material Processing for Solar Energy, 84730D (12 October 2012); https://doi.org/10.1117/12.930491

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