Analysis of pinhole vector diffraction in visible-light

Li Wang; ChangHui Rao; XueJun Rao; JinSheng Yang

doi:10.1117/12.974352

15 October 2012 Analysis of pinhole vector diffraction in visible light

Li Wang, ChangHui Rao, XueJun Rao, JinSheng Yang

Proceedings Volume 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems; 84181C (2012) https://doi.org/10.1117/12.974352
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

Using Hartmann-Shack (H-S) wave-front sensor to test lenses with high numerical aperture, the reference spherical wave-front from pinhole is used to calibrate the Hartmann sensor to improve the precision of calibration, but intensity uniformity of the reference spherical wave-front affects the precision of Hartmann sensor’s calibration. Based on the vector diffraction theory, intensity uniformity is calculated with finite-difference time-domain method in case of a converging Gaussian incident visible light on pinhole. In order to proof the correctness of the intensity model of pinhole vector diffraction, experimentation of intensity is performed in visible-light. When the pinhole is the material aluminum with thickness 200nm and pinhole diameter 500nm, the absolute error of intensity uniformity is about 2.57% and 2.31% within 0.75 NA and 0.5 NA of diffracted wave-front by comparing experiment result with simulation result, so the intensity model is accurate.

Citation Download Citation

Li Wang, ChangHui Rao, XueJun Rao, and JinSheng Yang "Analysis of pinhole vector diffraction in visible light", Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 84181C (15 October 2012); https://doi.org/10.1117/12.974352

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