Computational lithography work flows and design rule exploration automation

S. Sethi; William Stanton; Kevin Lucas; Jay Hiserote; Duck-Hyung Hur; Rooli Choi

doi:10.1117/12.918057

14 March 2012 Computational lithography work flows and design rule exploration automation

S. Sethi, William Stanton, Kevin Lucas, Jay Hiserote, Duck-Hyung Hur, Rooli Choi

Author Affiliations +

Proceedings Volume 8327, Design for Manufacturability through Design-Process Integration VI; 83270O (2012) https://doi.org/10.1117/12.918057
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Lithography development has become extremely computationally intensive. For a particular technology node being developed, it is critical to determine the optimum source and OPC/RET for each layer. In this paper we present a flexible new computation system for automation of source, OPC and RET optimization of advanced lithography layers. Of course, before determining the optimum source/RET/OPC of any layer, it is equally critical to determine the design rules which can be manufactured at a particular technology node. The design rule computational lithography problem is a superset of the source/OPC/RET optimization problem. With an automated methodology, time for process development can be reduced dramatically if a process development engineer can determine the design rules through accurate, automated simulation of the entire flow.

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S. Sethi, William Stanton, Kevin Lucas, Jay Hiserote, Duck-Hyung Hur, and Rooli Choi "Computational lithography work flows and design rule exploration automation", Proc. SPIE 8327, Design for Manufacturability through Design-Process Integration VI, 83270O (14 March 2012); https://doi.org/10.1117/12.918057

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KEYWORDS

Source mask optimization

Optical proximity correction

Optimization (mathematics)

Computational lithography

Atrial fibrillation

Resolution enhancement technologies

Lithography

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