The study of synthesis and photocuring behaviors of organic silicon modified methylacrylate and acrylate

Si-yuan Wang; Ying-quan Zou

doi:10.1117/12.916673

23 March 2012 The study of synthesis and photocuring behaviors of organic silicon modified methylacrylate and acrylate

Si-yuan Wang, Ying-quan Zou

Proceedings Volume 8322, Extreme Ultraviolet (EUV) Lithography III; 83222G (2012) https://doi.org/10.1117/12.916673
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Ten different silicon-containing methyl acrylate and acrylate monomers were synthesized by the substitution reaction of chlorosilanes or chlorosiloxanes with 2-Hydroxyethyl methacrylate or 2-Hydroxyethyl acrylate. Using triethylamine as the catalytic agent, tetrahydrofuran as the solvent, pure products can be obtained with one-step reaction after reduced pressure distillation or column chromatography via controlling raw ratio and reaction time. In this study, one to four silicon contained methyl acrylate and acrylate monomers were synthesized with simple methd and high yield. Monomers' properties were characterized through IR, 1H-NMR, 13C-NMR and their viscosity and thermostability were also characterized. The polymers' have good performance on UV-curing and low surface energy.

Citation Download Citation

Si-yuan Wang and Ying-quan Zou "The study of synthesis and photocuring behaviors of organic silicon modified methylacrylate and acrylate", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83222G (23 March 2012); https://doi.org/10.1117/12.916673

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