Phase defect mitigation strategy: fiducial mark requirements on extreme ultraviolet lithography mask

Tetsunori Murachi; Tsuyoshi Amano; Sung Hyun Oh

doi:10.1117/12.916141

23 March 2012 Phase defect mitigation strategy: fiducial mark requirements on extreme ultraviolet lithography mask

Tetsunori Murachi, Tsuyoshi Amano, Sung Hyun Oh

Proceedings Volume 8322, Extreme Ultraviolet (EUV) Lithography III; 83221Q (2012) https://doi.org/10.1117/12.916141
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

For Extreme Ultra-Violet Lithography (EUVL), fabrication of defect free multi-layered (ML) mask blanks is one of the difficult challenges. ML defects come from substrate defects and adders during ML coating, cannot be removed, and are called as phase defect. If we can accept ML blanks with certain number of phase defects, the blank yield will be drastically up. In order to use such blanks, the phase defects need to be identified and located during ML blank defect inspection before absorber patterning. To locate phase defects on the blanks accurately and precisely, Fiducial Marks (FM) on ML blanks are needed for mask alignment and defect location information. The proposed requirement of defect location accuracy is ≤20 nm [1]. In this paper, we will present the result of feasibility study on the requirements of FM on EUVL mask by simulations & experiments to establish the phase defect mitigation method with EUV Actinic Blank Inspection (ABI) tool. And the optimum ranges of FM line width, depth, and fabrication method on EUVL mask based on above results are ≥ 5 um line width, ≥ 100 nm depth FM etched into ML respectively, and additional finer FMs for magnified optics.

Citation Download Citation

Tetsunori Murachi, Tsuyoshi Amano, and Sung Hyun Oh "Phase defect mitigation strategy: fiducial mark requirements on extreme ultraviolet lithography mask", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83221Q (23 March 2012); https://doi.org/10.1117/12.916141

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available